Jane P. Chang | |
|---|---|
| Alma mater | National Taiwan University, Massachusetts Institute of Technology |
| Scientific career | |
| Fields | Electrochemistry, Chemical engineering |
| Institutions | University of California Los Angeles (UCLA) |
| Thesis | Study of plasma-surface kinetics and simulation of feature profile evolution in chlorine etching of patterned polysilicon (1998) |
| Doctoral advisor | Herbert H. Sawin |
Jane Pei-chen Chang (born 1967) is an American chemical engineer and materials scientist known for her research developing advanced atomic layer deposition (ALD) and etching techniques. Her research focuses on creating thin films and coatings with precise properties for use in microelectronics, energy devices, and other advanced materials applications.