Mask data preparation

Mask data preparation (MDP), also known as layout post processing, is the procedure of translating a file containing the intended set of polygons from an integrated circuit layout into set of instructions that a photomask writer can use to generate a physical mask. Typically, amendments and additions to the chip layout are performed in order to convert the physical layout into data for mask production.^[1]

Mask data preparation requires an input file which is in a GDSII or OASIS format, and produces a file that is in a proprietary format specific to the mask writer.

^ J. Lienig, J. Scheible (2020). "Chap. 3.3: Mask Data: Layout Post Processing". Fundamentals of Layout Design for Electronic Circuits. Springer. pp. 102–110. doi:10.1007/978-3-030-39284-0. ISBN 978-3-030-39284-0. S2CID 215840278.

[Layout_book-1] J. Lienig, J. Scheible (2020). "Chap. 3.3: Mask Data: Layout Post Processing". Fundamentals of Layout Design for Electronic Circuits. Springer. pp. 102–110. doi:10.1007/978-3-030-39284-0. ISBN 978-3-030-39284-0. S2CID 215840278.

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