Open Artwork System Interchange Standard

OASIS
Developed bySEMI
Initial releaseSeptember 2002;
22 years ago
 (2002-09)[1]
StandardsSEMI P39-0416[2]
Open format?Yes
Free format?No
WebsiteSEMI SEMI P39 - Specification for OASIS (P39-0416)

Open Artwork System Interchange Standard (OASIS[3]) is a binary file format used for specification of data structures for photomask production.[4] It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during integrated circuit design that is further used for manufacturing of a photomask. The standard is developed by SEMI.[2][1] The language defines the code required for geometric shapes such as rectangles, trapezoids, and polygons. It defines the type of properties each can have, how they can be organized into cells containing patterns made by these shapes and defines how each can be placed relative to each other. It is similar to GDSII.

As of 2023 the cost of the standard for members of SEMI was set to $252 and non-members: US$335.[5]

  1. ^ a b "About OASIS SEMI P39". www.yottadatasciences.com. Retrieved 2022-05-26.
  2. ^ a b "OASIS". www.layouteditor.org. Retrieved 2022-05-26.
  3. ^ The trade name OASIS is a registered trademark in the USA of Thomas J. Grebinski, Alamo, California and licensed for use exclusively by SEMI.
  4. ^ "SEMI P39 : 2016 SPECIFICATION FOR OASIS - OPEN ARTWORK SYSTEM INT". infostore.saiglobal.com. Retrieved 2023-05-23.
  5. ^ "P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard". semi.org. Retrieved 2023-05-23.