Inductively coupled plasma

Fig. 1. Picture of an analytical ICP torch

An inductively coupled plasma (ICP) or transformer coupled plasma (TCP)[1] is a type of plasma source in which the energy is supplied by electric currents which are produced by electromagnetic induction, that is, by time-varying magnetic fields.[2]

  1. ^ High density fluorocarbon etching of silicon in an inductively coupled plasma: Mechanism of etching through a thick steady state fluorocarbon layer Archived 2016-02-07 at the Wayback Machine T. E. F. M. Standaert, M. Schaepkens, N. R. Rueger, P. G. M. Sebel, and G. S. Oehrleinc
  2. ^ A. Montaser and D. W. Golightly, ed. (1992). Inductively Coupled Plasmas in Analytical Atomic Spectrometry. VCH Publishers, Inc., New York.