Tungsten hexafluoride

Tungsten hexafluoride
	; Solid WF6 melting into liquid WF6
Tungsten(VI) fluoride	Ball-and-stick model of tungsten hexafluoride
Names
	IUPAC names Tungsten hexafluoride; Tungsten(VI) fluoride
Identifiers
CAS Number	7783-82-6 ;
3D model (JSmol)	Interactive image;
ECHA InfoCard	100.029.117
EC Number	232-029-1;
PubChem CID	522684;
UNII	45B0AG2C4S ;
UN number	2196
CompTox Dashboard (EPA)	DTXSID80893770 ;
	InChI InChI=1S/6FH.W/h6*1H;/q;;;;;;+6/p-6;
	SMILES F[W](F)(F)(F)(F)F;
Properties
Chemical formula	WF6
Molar mass	297.830 g/mol
Appearance	Colorless gas
Density	12.4 g/L (gas) ; 4.56 g/cm3 (−9 °C, solid)
Melting point	2.3 °C (36.1 °F; 275.4 K)
Boiling point	17.1 °C (62.8 °F; 290.2 K)
Solubility in water	Hydrolyzes
Magnetic susceptibility (χ)	−40.0·10−6 cm3/mol
Structure
Molecular shape	Octahedral
Dipole moment	zero
Hazards
	Occupational safety and health (OHS/OSH):
Main hazards	Toxic, corrosive; gives HF on contact with water
	GHS labelling:
Pictograms
Signal word	Danger
Hazard statements	H301+H311, H314, H330
Precautionary statements	P260, P264, P264+P265, P270, P271, P280, P284, P301+P316, P301+P330+P331, P302+P352, P302+P361+P354, P304+P340, P305+P354+P338, P316, P317, P320, P321, P330, P361+P364, P363, P403+P233, P405, P410+P403, P501
NFPA 704 (fire diamond)	3 0 2 W
Flash point	Non-flammable
Safety data sheet (SDS)	ChemAdvisor
Related compounds
Other anions	Tungsten hexachloride; Tungsten hexabromide
Other cations	Chromium(VI) fluoride; Molybdenum(VI) fluoride
Related compounds	Tungsten(IV) fluoride; Tungsten(V) fluoride
	Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa). verify (what is ?) Infobox references

Tungsten(VI) fluoride, also known as tungsten hexafluoride, is an inorganic compound with the formula W F₆. It is a toxic, corrosive, colorless gas, with a density of about 13 kg/m³ (22 lb/cu yd) (roughly 11 times heavier than air).^[2]^[3] It is the only known gaseous transition metal (or d-block) compound and the densest known gas under standard ambient temperature and pressure (298 K, 1 atm).^[4] WF₆ is commonly used by the semiconductor industry to form tungsten films, through the process of chemical vapor deposition. This layer is used in a low-resistivity metallic "interconnect".^[5] It is one of seventeen known binary hexafluorides.

^ "Tungsten hexafluoride". pubchem.ncbi.nlm.nih.gov.
^ Roucan, J.-P.; Noël-Dutriaux, M.-C. Proprietes Physiques des Composes Mineraux. Ed. Techniques Ingénieur. p. 138.
^ Gas chart (Wayback Machine archive 7 September 2022)
^ Cite error: The named reference b1 was invoked but never defined (see the help page).
^ "Tungsten and Tungsten Silicide Chemical Vapor Deposition". CVD Fundamentals. TimeDomain CVD.

[1] "Tungsten hexafluoride". pubchem.ncbi.nlm.nih.gov.

[2] Roucan, J.-P.; Noël-Dutriaux, M.-C. Proprietes Physiques des Composes Mineraux. Ed. Techniques Ingénieur. p. 138.

[3] Gas chart (Wayback Machine archive 7 September 2022)

[b1-4] Cite error: The named reference b1 was invoked but never defined (see the help page).

[5] "Tungsten and Tungsten Silicide Chemical Vapor Deposition". CVD Fundamentals. TimeDomain CVD.

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